Atomic Layer Processing

Atomic Layer Processing

Semiconductor Dry Etching Technology

Wiley-VCH Verlag GmbH

04/2021

325

Mole

Inglês

9783527346684

Pré-lançamento - envio 15 a 20 dias após a sua edição

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INTRODUCTION Brief history of etching Role of etching in the IT revolution Etching terminology: Profile control, selectivity, uniformity, aspect ratio dependent etching FUNDAMENTALS OF HOW TO REMOVE AN ATOM FROM A SURFACE Chemical surface modification Types of activation energies Taxonomy of etching technologies THERMAL OR VAPOR ETCHING Mechanisms Applications THERMAL OR ISOTROPIC ATOMIC LAYER ETCHING Mechanisms Applications RADICAL ETCHING Mechanisms Applications ION ASSISTED OR DIRECTIONAL ATOMIC LAYER ETCHING Mechanisms Applications REACTIVE ION ETCHING Mechanisms Applications ION BEAM ETCHING Mechanisms Applications ETCHING REACTOR DESIGN FUNDAMENTALS Introduction Tools for thermal etching Plasma tools COMBINING ETCHING AND DEPOSITION EMERGING ETCHING TECHNOLOGIES: LASER AND ELECTRON BEAM ASSISTED ETCHING MODELING OF ETCHING: REACTIVE ION ETCHING, DIRECTIONAL ALE, AND ION BEAM ETCHING PROCESS CONTROL AND THE ROLE OF ARTIFICIAL INTELLIGENCE IN ETCHING PROCESS CONTROL
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